Published/Posted: October 21, 2014
Authors: P. Apiratikul; J. J. Wathen; G. A. Porkolab; B. Wang; L. He; T. E. Murphy; C. J. K. Richardson
DOI: 10.1364/OE.22.026814
Abstract: Enhancements of the continuous-wave four-wave mixing conversion efficiency and bandwidth are accomplished through the application of plasma-assisted photoresist reflow to reduce the sidewall roughness of sub-square-micron-modal area waveguides. Nonlinear AlGaAs optical waveguides with a propagation loss of 0.56 dB/cm demonstrate continuous-wave four-wave mixing conversion efficiency of −7.8 dB. Narrow waveguides that are fabricated with engineered processing produce waveguides with uncoated sidewalls and anti-reflection coatings that show group velocity dispersion of +0.22 ps^2/m. Waveguides that are 5 mm long demonstrate broadband four-wave mixing conversion efficiencies with a half-width 3-dB bandwidth of 63.8 nm.Citation:
P. Apiratikul, J. J. Wathen, G. A. Porkolab, B. Wang, L. He, T. E. Murphy and C. J. K. Richardson, "Enhanced continuous-wave four-wave mixing efficiency in nonlinear AlGaAs waveguides", Opt. Express 22(22) 26814-26824 (2014)
Export: BibTeX | RIS
Manuscript: Apiratikul_OE_22_26814_2014.pdf