Anisotropically Etched Silicon Surfaces for Planar Plasmonic Terahertz Guided Wave Devices

Published/Posted: June 6, 2014

Authors: Kumar, G.; Li, S.; Jadidi, M. M.; Murphy, T. E.

DOI: 10.1364/CLEO_AT.2014.JW2A.97

Abstract: We report a terahertz waveguide fabricated from doped crystalline silicon. Anisotropic chemically etching is used to produce a periodic array of concave pyramidal troughs in the silicon that provide confinement in both transverse directions.

Citation:
G. Kumar, S. Li, M. M. Jadidi and T. E. Murphy, "Anisotropically Etched Silicon Surfaces for Planar Plasmonic Terahertz Guided Wave Devices", Conference on Lasers and Electrooptics (CLEO), San Jose, CA (USA) JW2A.97 (2014)