Published/Posted: November 1, 1999
Authors: Lim, M. H.; Murphy, T. E.; Ferrera, J.; Damask, J. N.; Smith, H. I.
DOI: 10.1116/1.590981
Abstract: We describe a novel, versatile process for fabricating integrated Bragg-grating devices. Our process addresses many of the critical challenges presented by such devices, including period selection, alignment, spatial coherence, and nanolithography. Using a combination of e-beam, x-ray, optical, and interference lithographies, we have successfully employed this process to construct 244 nm period, quarter-wave-shifted Bragg gratings on top of 1-um-tall waveguide structures in InP.Citation:
M. H. Lim, T. E. Murphy, J. Ferrera, J. N. Damask and H. I. Smith, "Fabrication techniques for grating-based optical devices", J. Vac. Sci. Technol. B 17(6) 3208-3211 (1999)
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Manuscript: Lim_JVSTB_17_3208_1999.pdf
