Published/Posted: September 18, 2009

Authors: Lo, S.-Z. A.; Murphy, T. E.

DOI: 10.1364/OL.34.002921

Abstract: We describe the fabrication, simulation, and measurement of a terahertz (THz) filter composed of nanoporous silicon multilayers. Using electrochemical etching, we fabricated a structure composed of alternating high- and low-index layers that achieves 93% power reflectivity at the target wavelength of 1.17 THz, with a stopband of 0.26 THz. The measured reflection and transmission spectra of the multilayer filter show excellent agreement with calculations based on the refractive indices determined separately from single-layer measurements. This technique could provide a convenient, flexible, and economical way to produce THz filters, which are essential in a variety of future applications.

S.-Z. A. Lo and T. E. Murphy, "Nanoporous silicon multilayers for terahertz filtering", Opt. Lett. 34(19) 2921-2923 (2009)
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Manuscript: Lo_OL_34_2921_2009.pdf

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